Fabrication of Silicon Nanostructure by Metal-assisted Etching and Its Effects to Matrix-free Laser Desorption/ionization Mass Spectrometry
نویسندگان
چکیده
Silicon nanostructure surface fabricated from metal-assisted etching have been demonstrated as high sensitivity matrix-free laser desorption/ionization mass spectrometry chip. The silicon nanostructure morphology was found to have direct effect to the mass spectrometry ionization efficiency. Creation of different silicon nanostructure morphologies by changing the metal thickness, etching time and etchant composition in metal-assisted process was explored and its effects to mass spectrometry ionization efficiency was investigated in this paper.
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